LiU » ms2e » Research » Högberg

Age Hardening in Thin Films

Project coordinator: Hans Högberg

Centrum Partners:

  • David Trinh, Hans Högberg and Igor Abrikosov (Linköping)
  • Tomas Nyberg and Oliver Kappertz (Uppsala)

External Partners

  • Prof. Jochen Schneider (RWTH Aachen)

Scientific Objectives

  • To gain more a detailed knowledge of the Growth-Structure-Property relationships for Al2O3/ZrO2 nanocomposites from both experimental and theoretical studies, emphasizing a controlled synthesis of these materials as functional thin films.

Technology Transfer Objectives

  • Collaboration with patent applications (SE0600104-4 presently filed) together with AB Sandvik Tooling

Research plan:

From synthesis and characterization studies of primarily Al2O3/ZrO2, we seek to investigate fundamental aspects of the PVD process for alumina based nanocomposite oxide thin films. These are i) film/substrate interaction, ii) transport of the growth flux (plasma conditions) and iii) interaction between the target material and a reactive gas. To enable a controlled synthesis of these materials, a detailed knowledge on microstructure, phase distribution, interface properties et.c. is of highest importance. For this we will apply characterization on an atomic level using state of the art HREM including EELS to complement the more traditional but yet important structural and mechanical analyses. Support and valuable insights to the properties of these nanocomposites, as well as other carbide or nitride based nanocomposite systems, will be given by the theoretical treatment of such materials. For this we will initiate specific projects with the theoreticians at LiTH as well as use the competences available at the whole strategic research centre. Attempting to further develop the deposition process, we will study the plasma conditions in reactive and non-reactive RF sputtering as a first step, while later focusing on developing processes based on DC techniques. The expertise available in Uppsala on development and modeling of reactive sputtering processes, including the interaction between the sputtering gas and the target material, will be valuable assets for further progress in this key area for the project.

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