Martina Lattemann, Daniel Lundin, Daniel Jädernäs, Jens Birch, and Valeriu Chirita (Linköping)
Thomas Nyberg and Sören Berg (Uppsala)
Suzanne Rohde and Scott Kirkpatrick (Linköping & Lincoln, University of Nebraska)
External Partners:
Nils Brenning, Space and Plasma Physics, Royal Institute of Technology, Stockholm
Chemfilt Ionsputtering AB
Impact Coatings AB
Scientific Objectives
The technological gain in using an ionized deposition flux can in some situations be huge. Control over energy and flux of the ions are easily obtained using electric and magnetic field, and the microstructure and distribution of the deposited thin film can be optimized. The main concern for many applications is to increase the overall film deposition rate, which is also addressed in this project.
Technology Transfer Objectives
Several industrial partners (two listed above) are involved in projects with us. A PhD-has recently been be engaged in cooperation with Impact Coatings AB.
