Plasma and Coatings Physics
The Plasma & Coatings Physics group is a division at the Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden. Our overall goal is to contribute towards addressing challenges of contemporary materials science and technology through the synthesis of novel films and nanomaterials.
A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented. It is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Neon as the sputtering gas.
Highly read & Cited Articles
High power impulse magnetron sputtering discharge, J. Vac. Technol. A, 30, 030801 (2012) was the 15th most downloaded in the journal during March 2013.
Highly cited articles
(Updated 2015-11-05 08:28)
A novel pulsed magnetron sputter technique utilizing very high target power densities. Rank 5 of 18,322 (all years) in Surf. Coat. Technol.
Ionized physical vapor deposition (IPVD): A review of technology and applications. Rank 25 of 38,201 (all years) in Thin Solid Films.
Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness. Rank 132 of 108,834 (all years) in J. Appl. Phys.
Last updated: 2015-11-19