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 Plasma and Coatings Physics

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The Plasma & Coatings Physics group is a division at the Department of Physics, Chemistry and Biology (IFM)Linköping University, Sweden. Our overall goal is to contribute towards addressing challenges of contemporary materials science and technology through the synthesis of novel films and nanomaterials.


Research highlights

High ionization degree of carbon

A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented. It is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Neon as the sputtering gas.


New Postdoctor Position

The present position involves work with nanoparticle synthesis utilizing a newly developed pulsed hollow cathode sputtering technology. The work will be experimental in nature and the successful candidate will be asked to participate in a project focused on plasma synthesis of photoluminescent particles, one of several application-oriented subprojects related to nanoparticle activities in the division. Deadline for applications Jan. 18, 2015.

A large KAW grant to Ulf Helmersson

A consortium lead by Ulf Helmersson is granted SEK 23 004 000 for "Designed Nanoparticles by Pulsed Plasmas" by the Knut and Alice Wallenberg foundation. The funding is for three years 2015-2017.

Entrepreneurial prize to Ulf Helmersson

Ulf have been selected to be "the entrepreneurial researcher of the year" (2013) at Linköping University by the Innovation Office.

Highly read & Cited Articles

Highly cited

In JVST A the article "High power impulse magnetron sputtering discharge" is number nine in the list of most cited 2011-2012 papers during 2013.


Most read

High power impulse magnetron sputtering discharge, J. Vac. Technol. A, 30, 030801 (2012) was the 15th most downloaded in the journal during March 2013.


Highly cited articles

A novel pulsed magnetron sputter technique utilizing very high target power densities. Rank 5 of 17,136 (all years) in Surf. Coat. Technol.

Ionized physical vapor deposition (IPVD): A review of technology and applications. Rank 27 of 36,894 (all years) in Thin Solid Films.

Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness. Rank 126 of 104,266 (all years) in J. Appl. Phys.



Knut och Alice Wallenbergs stiftelse VR






Page manager: ulf.helmersson@liu.se
Last updated: 2014-12-17